Loschner, Hans: search on Z-Library

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1

Ion projection lithography for sub-micron modification of materials

Gerhard Stengl, Hans Löschner, Peter Wolf

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1987

Language:

english

File:

PDF, 4.36 MB

english, 1987

2

Preface

Fritz Paschke, Wolfgang Fallman, Hans Löschner

Journal:

Microelectronic Engineering

Year:

1989

Language:

english

File:

PDF, 111 KB

english, 1989

3

Ion Projection Lithography: Progress of European MEDEA & International Program

Rainer Kaesmaier, Hans Löschner

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 3.06 MB

english, 2000

4

Ein modularer Ansatz zur gezielten Herstellung nanostrukturierter Hybridmaterialien: die simultane Zwillingspolymerisation

Tina Löschner, Alexander Mehner, Dr. Silke Grund, Dr. Andreas Seifert, Dr. Andreas Pohlers, Dr. Arno Lange, Dr. Gerhard Cox, Dr. Hans-Joachim Hähnle, Prof. Dr. Stefan Spange

Journal:

Angewandte Chemie

Year:

2012

Language:

german

File:

PDF, 3.77 MB

german, 2012

5

A Modular Approach for the Synthesis of Nanostructured Hybrid Materials with Tailored Properties: The Simultaneous Twin Polymerization

Tina Löschner, Alexander Mehner, Dr. Silke Grund, Dr. Andreas Seifert, Dr. Andreas Pohlers, Dr. Arno Lange, Dr. Gerhard Cox, Dr. Hans-Joachim Hähnle, Prof. Dr. Stefan Spange

Journal:

Angewandte Chemie International Edition

Year:

2012

Language:

english

File:

PDF, 3.77 MB

english, 2012

6

Ion projection lithography: status of tool and mask developments

Rainer Kaesmaier, Albrecht Ehrmann, Hans Löschner

Journal:

Microelectronic Engineering

Year:

2001

Language:

english

File:

PDF, 1.14 MB

english, 2001

7

Influence of Silicon on Insulator Wafer Stress Properties on Placement Accuracy of Stencil Masks

Kamm, Frank-Michael, Ehrmann, Albrecht, Schäfer, Herbert, Pamler, Werner, Käsmaier, Rainer, Butschke, Jörg, Springer, Reinhard, Haugeneder, Ernst, Löschner, Hans

Journal:

Japanese Journal of Applied Physics

Year:

2002

Language:

english

File:

PDF, 111 KB

english, 2002

8

SPIE Proceedings [SPIE Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V - Kawasaki City, Japan (Thursday 9 April 1998)] Photomask and X-Ray Mask Technology V - Ion projection lithography

Melngailis, John, Loschner, Hans, Stengl, Gerhard, Berry, Ivan L., Mondelli, Alfred A., Gross, Gerhard, Aizaki, Naoaki

Year:

1998

Language:

english

File:

PDF, 3.33 MB

english, 1998